Case Study: NewPath Research LLC achieves sub-nm semiconductor carrier profiling with National Instruments

Semiconductor Carrier Profiling at Sub-10 nm Lithography Nodes

NewPath Research LLC, a research company, needed to develop a non-destructive method for semiconductor carrier profiling with sub-nanometer resolution to support the industry's move to sub-10 nm lithography nodes, as existing techniques were too coarse and invasive.

National Instruments provided the solution with a PXIe-5668R vector signal analyzer and LabVIEW software. This technology was used to measure a microwave frequency comb, enabling the development of a new technique called Scanning Frequency Comb Microscopy (SFCM). This method achieved the required sub-nm resolution without damaging delicate samples, and the solution is being considered by major semiconductor manufacturers as a new standard for advanced metrology.